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Zirconium silicide
Zirconium silicide (zirconium disilide) is an inorganic substance belonging to the zirconium-silicon intermetallic compound with the formula ZrSi2 .
Zirconium silicide structure and characteristics:
Zirconium silicide is prepared by silicon thermal reduction method, mechanical alloying method, self-propagation high-temperature synthesis method, reaction sintering and arc melting methodetc, etc. It can be obtained by the mixture of zirconium powder and silicon powder in the proportion of the mixture under the isolation of air by high temperature. Zirconium-cinnamon intermetallic compounds have high hardness, high melting point, high conductivity, high thermal conductivity, excellent thermal shock resistance and good corrosion resistance, and are generally not subject to strong acids and strong alkalis, including corrosion of aqua regia. Especially in the high-temperature environment, a strong passivated oxide layer can be formed on the surface, making it have high temperature oxidation resistance.
Product description
Zirconium silicide as a zirconium - silicon intermetallic compound, is a class of high-temperature ceramic materials with high hardness, high melting point, high conductivity, high thermal conductivity, excellent thermal shock resistance, in view of the zirconium - silicon intermetallic compound has these superior physicochemical properties, is a structural material or a new type of engineering material that can be applied to high-temperature corrosive media.
(1) Zirconium silicide can be used as lubricating materials, wear-resistant materials, semiconductor thin films, electronic materials, ceramic materials;
(2) Deoxidizer. In the steelmaking process, oxygen is removed from molten steel, and some ferroalloys can also remove other impurities such as sulfur and nitrogen in steel;
(3) Used as fine ceramic raw material powder, used for the production of semiconductor film production crucibles;
(4) Alloy additives. According to the requirements of the steel composition of the steel grade, alloying elements are added to the steel to improve the performance of the steel.
(5) Because silicon zirconium intermetallic compounds have excellent physical and chemical properties, ZrSi2 is a structural material or a new type of engineering material that can be used as a high-temperature corrosive medium.
Product parameters
The product name |
Zirconium silicide |
Density |
4.88g/cm³ |
Coefficient of thermal expansion |
- |
Molecular formula |
ZrSi2 |
Melting point |
1620℃ |
Mohs hardness |
6.5 |
Appearance form |
Gray-black gray powder |
Boiling point |
Cat760mmHg |
Microhardness |
1063kg/mm2 |
CAS number |
12039-90-6 |
Resistivity |
- |
Storage mode |
Closed at room temperature, cool, ventilated and dry
|
Molecular weight |
147.39 |
Electrical conductivity |
- |
- |
- |
Further reading
Uses of silicides: The physical and chemical properties of metal silicides make them multifaceted. First of all, silicide as a high-temperature structural material in aerospace, aviation, chemical industry has a good application prospects, as a high-temperature antioxidant coating, magnetic materials, integrated circuit electrode film and other functional materials have been widely studied and applied. For example, Fe3Si ordered alloy has excellent soft magnetic properties and is widely used in magnetic head materials for audio, video and card readers; Some silicides (e.g., V3Si, CoSi2, Mo3Si, PtSi) exhibit superconductivity, and V3Si is the first A15 phase to be found to have superconductivity. Its critical transition temperature is 17.1K; MoSi2 is widely used as a heating element for high-temperature electric furnaces and high-temperature antioxidant coatings for aerospace due to its excellent electrical properties and excellent oxidation resistance. Similarly, metal silicides play a very important role in the manufacture of microelectronic devices. Because the resistance of silicides is lower than that of polycrystalline silicon, and the interface between silicide and silicon matrix is an atomic-level clean interface, compatibility is very good, in the microelectronic device manufacturing industry, silicide films, such as NiSi, PtSi and PdSi, etc., as Schottky barrier and interconnection materials are widely used.
Related papers
[1]Chen Zhiqian,Lin Xingxiang,Li Chunmei. Study on the elasticity and anisotropy of zirconium silicide (ZrSi)[J].Journal of Southwest University (Natural Science Edition), 2016,38(03):1-8.DOI:10.13718/j.cnki.xdzk.2016.03.001.
[2]Wang Liangbiao, Zhou Ziming, Chen Zhe, et al. A method for preparing zirconium silicide nanomaterials:, CN111592000A[P]. 2020.
[3]Liu Hongxia. Study on the preparation of zirconium silicide, zirconium carbide and their composites by molten salt electrochemical method[D]. Northeastern University, 2017.
Product Showcase
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XRD spectrogram, SEM scanning electron microscopy, laser particle size
Recommended product 2: Zirconium silicide 4004016 particle size 0.8μm
Product test report: SEM scan electron microscopy
Product purchase Q&A
Q: We use it in the lab, do you have small packages?
A: Yes, for laboratory needs, we generally have 100g/250g/500g/1kg and other packaging specifications to meet the needs of laboratory research users.
Q: I see that some companies offer 99.9% of the products, why don't you have such high-purity products?
A: The purity of the product is determined by many factors such as raw materials, production processes, testing methods and other aspects of the product. Different detection methods for the same material, may vary greatly in purity. In addition to purity concerns, you need to understand what the purity test method is to determine the reliability of this purity. It is quite possible that the actual purity of a 98% purity product and a product of 99.9% purity is much the same.